[Source: "High-tech LED - "Technology and Applications" July issue text / Liang Bingwen]
Due to the demand forecast of the domestic semiconductor lighting industry and the encouragement of some local government subsidy policies, China's MOCVD equipment procurement has shown a “crazy†situation in 2010-2011. Before 2010, the total installed capacity of MOCVD in mainland China was only about 150, and it reached 350 at the end of 2010. At the end of 2011, it was close to the peak of 700, and MOCVD was mainly based on production equipment. .
As early as the 1980s, there were individual research institutes in China that attempted to develop and develop domestic MOCVD equipment. And the work in this area has never stopped. The early R&D units mainly included the Shanghai Institute of Metallurgy of the Chinese Academy of Sciences (now the Shanghai Institute of Microsystems) and the Changchun Institute of Physics of the Chinese Academy of Sciences. There are 48 recent institutes, the Institute of Semiconductors of the Chinese Academy of Sciences, and Xi'an University of Electronics. However, these work are mainly based on research units and operate in the form of scientific research projects (including the 863 project). It was not until 2008-2009 that MOCVD equipment projects with commercial operations as the main purpose appeared in China. Some investors and equipment-related technologies and managers began to prepare for the establishment of MOCVD equipment companies.
A high-performance MOCVD device must work with controllability, repeatability, reliability, stability, ease of operation and maintenance, while operating at a lower cost. Since the current MOCVD equipment is getting bigger and bigger, and each furnace has a long running time, the running cost is very high. In addition, commissioning and maintaining a MOCVD operation requires a high level of process technicians. Due to the high manpower and material resources, it is difficult for LED epitaxy and chip factories to easily accept an MOCVD device with uncertain performance.
In view of the high requirements of LED epitaxial chip customers for MOCVD equipment manufacturers, even engineers and technicians with many years of experience in semiconductor equipment companies need a long learning process to do GaN MOCVD equipment. It is even more difficult to make commercial MOCVD equipment products that are easy to use in a short period of time. Only those companies that know how to industrialize GaNLED MOCVD process technology and know how to industrialize MOCVD equipment can hope to make good use of domestic MOCVD equipment. This is easy to say and hard to do! If such a team cannot be formed in a timely and effective manner, the price to pay is opportunity, time and money.
For more information, please refer to "High-tech LED - "Technology and Applications" magazine July issue
Due to the demand forecast of the domestic semiconductor lighting industry and the encouragement of some local government subsidy policies, China's MOCVD equipment procurement has shown a “crazy†situation in 2010-2011. Before 2010, the total installed capacity of MOCVD in mainland China was only about 150, and it reached 350 at the end of 2010. At the end of 2011, it was close to the peak of 700, and MOCVD was mainly based on production equipment. .
As early as the 1980s, there were individual research institutes in China that attempted to develop and develop domestic MOCVD equipment. And the work in this area has never stopped. The early R&D units mainly included the Shanghai Institute of Metallurgy of the Chinese Academy of Sciences (now the Shanghai Institute of Microsystems) and the Changchun Institute of Physics of the Chinese Academy of Sciences. There are 48 recent institutes, the Institute of Semiconductors of the Chinese Academy of Sciences, and Xi'an University of Electronics. However, these work are mainly based on research units and operate in the form of scientific research projects (including the 863 project). It was not until 2008-2009 that MOCVD equipment projects with commercial operations as the main purpose appeared in China. Some investors and equipment-related technologies and managers began to prepare for the establishment of MOCVD equipment companies.
A high-performance MOCVD device must work with controllability, repeatability, reliability, stability, ease of operation and maintenance, while operating at a lower cost. Since the current MOCVD equipment is getting bigger and bigger, and each furnace has a long running time, the running cost is very high. In addition, commissioning and maintaining a MOCVD operation requires a high level of process technicians. Due to the high manpower and material resources, it is difficult for LED epitaxy and chip factories to easily accept an MOCVD device with uncertain performance.
In view of the high requirements of LED epitaxial chip customers for MOCVD equipment manufacturers, even engineers and technicians with many years of experience in semiconductor equipment companies need a long learning process to do GaN MOCVD equipment. It is even more difficult to make commercial MOCVD equipment products that are easy to use in a short period of time. Only those companies that know how to industrialize GaNLED MOCVD process technology and know how to industrialize MOCVD equipment can hope to make good use of domestic MOCVD equipment. This is easy to say and hard to do! If such a team cannot be formed in a timely and effective manner, the price to pay is opportunity, time and money.
For more information, please refer to "High-tech LED - "Technology and Applications" magazine July issue
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